Atomic Layer Deposition (ALD) Market Overview 21-28

The Atomic Layer Deposition (ALD) Market operations are likely to be carried forward at a CAGR that accounts for 13.9% during the ongoing forecast period.

Atomic layer deposition or ALD is simply a vapor phase procedure that can produce thin films of various materials. It has a wide range of applications comprising electronics, construction, automotive and others. The growth of the global atomic layer deposition (ALD) market is driven by the application of ALD to complex semiconductor components, the demand for nanotechnology ALD equipment, the growth of the solar industry and the integration of ALD technology for low costs components in different industries.

Key trends that will continue to drive consumer demand for next-generation semiconductor products, forcing semiconductor industry participants to invest in new capacities and production equipment. The growing dedication of leading semiconductor giants to emphasize on invention and advanced product development in response to rising competition and growth in customer purchasing power is also impacting the market growth positively. Key investors and government are aggressively focusing on the advancements specially in microelectronics sector, foreseeing these technologies to turn as out disruptive in the coming future.

Smartphone penetration in developing markets is still in its infancy, and demand is anticipated to spur. At the same time, the development of new mobile innovations such as payment systems will also stimulate demand in well-established markets. Advancement in technology, application of ALD as fabrication and manipulation tool in nanotechnology is projected to boost the market growth in the coming future. Majority of the technology companies are integrating the machine learning and artificial intelligence with efficient materials engineering. This is expected to propel the growth of the global atomic layer deposition market.

Segmentation

The global atomic layer deposition market is majorly classified into type and application.

Based on the global atomic layer deposition market is bifurcated into aluminum oxide ALD, metal ALD, catalytic ALD, and plasma-enhanced ALD.

The global atomic layer deposition market is also divided into medical equipment, semiconductors, solar devices, instrumentation, electronics, nanotechnology, and flexible devices.

Regional Outlook

Based on the region, the atomic layer deposition market report comprises the latest trends and growth prospects in North America, Asia Pacific, Europe, Latin America, the Middle East, and Africa. The Asia Pacific region will influence the market during the forecast period. This is owing to the growing need for consumer electronics such as PCs, laptops, smartphones, and other devices, which has increased the use of complex chips and integrated circuits. In addition, the electronics industry in China, Taiwan, and South Korea are spurring market growth in the region. In addition, the constant development of solar energy systems stimulates the growth of the global atomic layer deposition market.

The US atomic layer market is anticipated to develop steadily over the forecast period. This is due to the development of the medical industry in this region.

The atomic layer deposition market in Europe is likely to grow at a healthy pace during the forecast period. This is due to the use in nanomaterial synthesis, the production of semiconductor equipment and the presence of various car manufacturers in this region.

Major players

The global players contributing with their product offerings and services include Veeco Instruments, CVD Equipment Corporation, ALD Vacuum Technologies GmbH, ASM International NV, Applied Materials, Inc, Applied Materials, Inc, Applied Materials, Inc, ALD NanoSolutions, Jiangsu Leadmicro Guide Nano Equipment Technology Co., Ltd, CVD Equipment Corporation, and Tokyo Electron Limited.

Recent Updates

Picosun, one of leading ALD equipment manufacturer, has bagged considerable investment led by Finnish investors. This funding has surged the share of the company’s capital by 12 million euros.  The investors that are engaged in the funding round include Risto Siilasmaa's First Fellow Partners, Finnish Industry Investment Oy, and CapMan Growth fund. Its previous investors also contributed to their add-on investments. It comprises Hannu Turunen and R.Ruth Oy.

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